Electron Beam Lithography
The University of Sheffield´s state-of-the-art Raith 150 electron-beam lithography (EBL) system is capable of producing nanostructures with dimensions of the order of 20nm. Since its commissioning in November 2001, this facility has played a major role in a number of nanotechnology research projects, and will continue to do so in the years ahead.
A full-time post-doctoral scientist runs the EBL facility with support from a team of highly skilled research and technical staff. It is a University-wide facility available to all disciplines of science and engineering. It is also available to external customers of the EPSRC National Centre for III-V technologies.